Authors: Abdollahi-Alibeik, S Zheng, J McVittie, JP Saraswat, KC Gabriel, CT Abraham, SC

Citation: S. Abdollahi-alibeik et al., Modeling and simulation of feature-size-dependent etching of metal stacks, J VAC SCI B, 19(1), 2001, pp. 179-185

Authors: Gabriel, CT Kim, RY Baker, DC

Citation: Ct. Gabriel et al., Integration of metal masking and etching for deep submicron patterning, J VAC SCI A, 18(4), 2000, pp. 1420-1424

Authors: Gabriel, CT

Citation: Ct. Gabriel, Gate oxide damage: Testing approaches and methodologies, J VAC SCI A, 17(4), 1999, pp. 1494-1500

Authors: Gabriel, CT

Citation: Ct. Gabriel, Curbing plasma-induced gate oxide damage, SOL ST TECH, 42(3), 1999, pp. 49

Authors: Gabriel, CT Yeh, EK

Citation: Ct. Gabriel et Ek. Yeh, In situ wafer temperature measurement during plasma etching, SOL ST TECH, 42(10), 1999, pp. 99