Citation: Jj. Guan et al., Effects of wet chemistry pre-gate clean strategies on the organic contamination of gate oxides for metal-oxide-semiconductor field effect transistor, JPN J A P 1, 39(7A), 2000, pp. 3947-3954
Citation: Ii. Suni et al., Dissolution kinetics for atomic, molecular, and ionic contamination from silicon wafers during aqueous processing, J ELCHEM SO, 146(9), 1999, pp. 3522-3526