Authors:
Wickland, H
Talevi, R
Bian, ZL
Nuesca, G
Sankaran, S
Kumar, K
Geer, RE
Kaloyeros, AE
Liu, J
Hummel, J
Shaffer, EO
Martin, SJ
Citation: H. Wickland et al., Integration of chemical vapor deposition Al interconnects in a benzocyclobutene low dielectric constant polymer matrix: A feasibility study, J VAC SCI B, 18(5), 2000, pp. 2463-2471
Authors:
Talevi, R
Gundlach, H
Bian, ZL
Knorr, A
van Gestel, M
Padiyar, S
Kaloyeros, AE
Geer, RE
Shaffer, EO
Martin, S
Citation: R. Talevi et al., Material and process studies in the integration of plasma-promoted chemical-vapor deposition of aluminum with benzocyclobutene low-dielectric constant polymer, J VAC SCI B, 18(1), 2000, pp. 252-261