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Nottola, A
Gerardino, A
Gentili, M
Di Fabrizio, E
Cabrini, S
Melpignano, P
Rotaris, G
Citation: A. Nottola et al., Fabrication of semi-continuous profile diffractive optical elements for beam shaping by electron beam lithography, MICROEL ENG, 53(1-4), 2000, pp. 325-328
Authors:
Gerardino, A
Gentili, M
Di Fabrizio, E
Calarco, R
Mastrogiacomo, L
Citation: A. Gerardino et al., Study of nanometer resolution resist slope for the UVIII chemically amplified resist., MICROEL ENG, 46(1-4), 1999, pp. 201-204
Authors:
Cui, Z
Gerardino, A
Gentili, M
DiFabrizio, E
Prewett, PD
Citation: Z. Cui et al., Comparative study of AZPN114 and SAL601 chemically amplified resists for electron beam nanolithography, J VAC SCI B, 16(6), 1998, pp. 3284-3288