Authors: Gerardino, A Di Fabrizio, E Nottola, A Cabrini, S Giannini, G Mastrogiacomo, L Gubbiotti, G Candeloro, P Carlotti, G

Citation: A. Gerardino et al., Electron-beam lithography patterning of magnetic nickel films, MICROEL ENG, 57-8, 2001, pp. 931-937

Authors: Nottola, A Gerardino, A Gentili, M Di Fabrizio, E Cabrini, S Melpignano, P Rotaris, G

Citation: A. Nottola et al., Fabrication of semi-continuous profile diffractive optical elements for beam shaping by electron beam lithography, MICROEL ENG, 53(1-4), 2000, pp. 325-328

Authors: Cabrini, S Gentili, M Di Fabrizio, E Gerardino, A Nottola, A Leonard, Q Mastrogiacomo, L

Citation: S. Cabrini et al., 3D microstructures fabricated by partially opaque X-ray lithography masks, MICROEL ENG, 53(1-4), 2000, pp. 599-602

Authors: Gubbiotti, G Albini, L Carlotti, G De Crescenzi, M Di Fabrizio, E Gerardino, A Donzelli, O Nizzoli, F Koo, H Gomez, RD

Citation: G. Gubbiotti et al., Finite size effects in patterned magnetic permalloy films, J APPL PHYS, 87(9), 2000, pp. 5633-5635

Authors: Gerardino, A Gentili, M Di Fabrizio, E Calarco, R Mastrogiacomo, L

Citation: A. Gerardino et al., Study of nanometer resolution resist slope for the UVIII chemically amplified resist., MICROEL ENG, 46(1-4), 1999, pp. 201-204

Authors: Cui, Z Gerardino, A Gentili, M DiFabrizio, E Prewett, PD

Citation: Z. Cui et al., Comparative study of AZPN114 and SAL601 chemically amplified resists for electron beam nanolithography, J VAC SCI B, 16(6), 1998, pp. 3284-3288