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Citation: R. Loesing et al., Secondary ion mass spectrometry depth profiling of ultrashallow phosphorous in silicon, J VAC SCI B, 18(1), 2000, pp. 509-513

Authors: Phillips, JR Griffis, DP Russell, PE

Citation: Jr. Phillips et al., Channeling effects during focused-ion-beam micromachining of copper, J VAC SCI A, 18(4), 2000, pp. 1061-1065