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Authors: KARAFYLLIDIS I HAGOUEL PI NEUREUTHER AR

Citation: I. Karafyllidis et al., NEGATIVE RESIST PROFILES IN 248 NM PHOTOLITHOGRAPHY - EXPERIMENT, MODELING AND SIMULATION, Semiconductor science and technology, 13(6), 1998, pp. 603-610

Authors: HAGOUEL PI KARAFYLLIDIS I NEUREUTHER AR

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Authors: HAGOUEL PI KARAFYLLIDIS I NEUREUTHER AR

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