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Authors: TSUTSUMI Y YAMAMOTO H HATTORI K OKAMOTO H HAMAKAWA Y
Citation: Y. Tsutsumi et al., STUDY OF BAND-EDGE PARAMETERS IN A-SI-H ALLOYS BY POLARIZED ELECTROABSORPTION EFFECTS, Journal of non-crystalline solids, 166, 1993, pp. 893-896

Authors: HATTORI K FUKUDA S NISHIMURA K OKAMOTO H HAMAKAWA Y
Citation: K. Hattori et al., INTERPRETATION OF CPM MEASUREMENTS IN AMORPHOUS-SEMICONDUCTORS, Journal of non-crystalline solids, 166, 1993, pp. 351-354

Authors: OKAMOTO H HATTORI K HAMAKAWA Y
Citation: H. Okamoto et al., HALL-EFFECT NEAR THE MOBILITY EDGE, Journal of non-crystalline solids, 166, 1993, pp. 445-448

Authors: KANASHIMA T NAGAYOSHI R OKUYAMA M HAMAKAWA Y
Citation: T. Kanashima et al., OPTICAL CHARACTERIZATIONS OF PHOTOINDUCED CHEMICAL-VAPOR-DEPOSITION PRODUCED SIO2-FILMS IN VACUUM-ULTRAVIOLET, ULTRAVIOLET, AND VISIBLE REGION, Journal of applied physics, 74(9), 1993, pp. 5742-5747

Authors: HATTORI K KOJI Y FUKUDA S MA W OKAMOTO H HAMAKAWA Y
Citation: K. Hattori et al., MODULATED PHOTOCARRIER GRATING TECHNIQUE FOR DIFFUSION LENGTH MEASUREMENT IN AMORPHOUS-SEMICONDUCTORS, Journal of applied physics, 73(8), 1993, pp. 3846-3851

Authors: SOHN SH HYUN DG DEGUCHI K HAMAKAWA Y
Citation: Sh. Sohn et al., ELECTROLUMINESCENCE IN ZNS1-XTEXCEF3 THIN-FILM DEVICES, Journal of applied physics, 73(8), 1993, pp. 4092-4094

Authors: IZUMITANI J OKUYAMA M HAMAKAWA Y
Citation: J. Izumitani et al., HIGH-SENSITIVITY INFRARED CHARACTERIZATION OF ULTRA-THIN SIO2 FILM ONSI BY GRAZING INTERNAL-REFLECTION, Applied spectroscopy, 47(9), 1993, pp. 1503-1508

Authors: SOHN SH HAMAKAWA Y
Citation: Sh. Sohn et Y. Hamakawa, ELECTROLUMINESCENCE IN OXYGEN CO-DOPED ZNS-TMF3 AND ZNS-TM, LI THIN-FILM DEVICES, Applied physics letters, 62(18), 1993, pp. 2242-2244
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