Authors: BOZON B ZIJLSTRA T GLUCK M HERSENER J VANDERDRIFT E KONIG U

Citation: B. Bozon et al., A LOW-TEMPERATURE GATE OXIDE PROCESS FOR N-CHANNEL SIGE MODULATION-DOPED FIELD-EFFECT TRANSISTORS, Journal of applied physics, 82(9), 1997, pp. 4611-4615

Authors: GLUCK M SCHUPPEN A ROSLER M HEINRICH W HERSENER J KONIG U YAM O CYTERMANN C EIZENBERG M

Citation: M. Gluck et al., COSI2 AND TISI2 FOR SI SIGE HETERODEVICES, Thin solid films, 270(1-2), 1995, pp. 549-554