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Results: 1-6 |
Results: 6

Authors: HIERLEMANN M WERNER C SPITZER A
Citation: M. Hierlemann et al., EQUIPMENT SIMULATION OF SIGE HETEROEPITAXY - MODEL VALIDATION BY AB-INITIO CALCULATIONS OF SURFACE-DIFFUSION PROCESSES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(4), 1997, pp. 935-941

Authors: SIMKA H HIERLEMANN M UTZ M JENSEN KF
Citation: H. Simka et al., COMPUTATIONAL CHEMISTRY PREDICTIONS OF KINETICS AND MAJOR REACTION PATHWAYS FOR GERMANE GAS-PHASE REACTIONS, Journal of the Electrochemical Society, 143(8), 1996, pp. 2646-2654

Authors: BRINKMANN RP FURST R WERNER C HIERLEMANN M
Citation: Rp. Brinkmann et al., A REDUCED-FLUID DYNAMIC DISCHARGE MODEL FOR APPLICATIONS IN TECHNOLOGY-ORIENTED COMPUTER-AIDED-DESIGN, Journal of the Electrochemical Society, 143(6), 1996, pp. 1940-1944

Authors: HIERLEMANN M SIMKA H JENSEN KF UTZ M
Citation: M. Hierlemann et al., KINETIC MODELING OF THE GAS-PHASE DECOMPOSITION OF GERMANE BY COMPUTATIONAL CHEMISTRY TECHNIQUES, Journal de physique. IV, 5(C5), 1995, pp. 71-77

Authors: HIERLEMANN M SIMKA H JENSEN KF UTZ M
Citation: M. Hierlemann et al., KINETIC MODELING OF THE GAS-PHASE DECOMPOSITION OF GERMANE BY COMPUTATIONAL CHEMISTRY TECHNIQUES, Journal de physique. IV, 5(C5), 1995, pp. 71-77

Authors: HIERLEMANN M KERSCH A WERNER C SCHAFER H
Citation: M. Hierlemann et al., A GAS-PHASE AND SURFACE KINETICS MODEL FOR SILICON EPITAXIAL-GROWTH WITH SIH2CL2 IN AN RTCVD REACTOR, Journal of the Electrochemical Society, 142(1), 1995, pp. 259-266
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