Authors: GOTOH Y NAKAYAMA Y MATSUZAKA T SAITOU N HOJYO Y KAWAHARA T TAWA T

Citation: Y. Gotoh et al., IMPROVED ALIGNMENT ACCURACY USING LENS-DISTORTION CORRECTION FOR ELECTRON-BEAM LITHOGRAPHY IN MIX-AND-MATCH WITH AN OPTICAL STEPPER, JPN J A P 1, 36(12B), 1997, pp. 7541-7545