Authors: GARDNER WL BADDORF AP HOLBER WM

Citation: Wl. Gardner et al., TEMPERATURE AND CONCENTRATION EFFECTS ON OZONE ASHING OF PHOTORESIST, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 1409-1412

Authors: OLSON RJ KAZIOR TE LANE B HOLBER WM BOURGET L

Citation: Rj. Olson et al., OPTIMIZATION OF A LOW DAMAGE, HIGH-RESOLUTION ETCH PROCESS FOR SINX IN AN ECR REACTOR, Journal of the Electrochemical Society, 143(1), 1996, pp. 288-292

Authors: CAUGHMAN JBO HOLBER WM

Citation: Jbo. Caughman et Wm. Holber, EFFECTS OF SUBSTRATE BIAS FREQUENCY IN AN ELECTRON-CYCLOTRON-RESONANCE PLASMA REACTOR, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2897-2902

Authors: HOLBER WM LOGAN JS GRABARZ HJ YEH JTC CAUGHMAN JBO SUGERMAN A TURENE FE

Citation: Wm. Holber et al., COPPER DEPOSITION BY ELECTRON-CYCLOTRON-RESONANCE PLASMA, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 2903-2910