Authors:
ETEMADI R
GODET C
PERRIN J
DREVILLON B
HUC J
PAREY JY
ROSTAING JC
COEURET F
Citation: R. Etemadi et al., DUAL-PLASMA REACTOR FOR LOW-TEMPERATURE DEPOSITION OF WIDE BAND-GAP SILICON ALLOYS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(2), 1997, pp. 320-331