Authors:
Haffouz, S
Kirilyuk, V
Hageman, PR
Macht, L
Weyher, JL
Larsen, PK
Citation: S. Haffouz et al., Improvement of the optical properties of metalorganic chemical vapor deposition grown GaN on sapphire by an in situ SiN treatment, APPL PHYS L, 79(15), 2001, pp. 2390-2392
Authors:
Nataf, G
Beaumont, B
Bouille, A
Vennegues, P
Haffouz, S
Vaille, M
Gibart, P
Citation: G. Nataf et al., High quality ELO-GaN layers on GaN/Al2O3 patterned substrates by halide vapour phase epitaxy, MAT SCI E B, 59(1-3), 1999, pp. 112-116
Authors:
Haffouz, S
Beaumont, B
Vennegues, P
Gibart, P
Citation: S. Haffouz et al., Optimization of Si/N treatment time of sapphire surface and its effect on the MOVPE GaN overlayers, PHYS ST S-A, 176(1), 1999, pp. 677-681
Authors:
Haffouz, S
Lahreche, H
Vennegues, P
de Mierry, P
Beaumont, B
Omnes, F
Gibart, P
Citation: S. Haffouz et al., The effect of the Si/N treatment of a nitridated sapphire surface on the growth mode of GaN in low-pressure metalorganic vapor phase epitaxy, APPL PHYS L, 73(9), 1998, pp. 1278-1280