Authors: Chan, VWC Hai, CH Chan, PCH

Citation: Vwc. Chan et al., Resist hardening by fluorocarbon plasma for electron-beam and optical mix-and-match lithography, J VAC SCI B, 19(3), 2001, pp. 743-748

Authors: Jin, W Liu, WD Hai, CH Chan, PCH Hu, CM

Citation: W. Jin et al., Noise modeling and characterization for 1.5-V 1.8-GHz SOI low-noise amplifier, IEEE DEVICE, 48(4), 2001, pp. 803-809