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Results: 1-9 |
Results: 9
Instrumentation advances with the new X-ray microscopes at BESSY II
Authors: Guttmann, P Niemann, B Thieme, J Hambach, D Schneider, G Wiesemann, U Rudolph, D Schmahl, G
Citation: P. Guttmann et al., Instrumentation advances with the new X-ray microscopes at BESSY II, NUCL INST A, 467, 2001, pp. 849-852
A rotating condenser and off-axis zone plate monochromator for the TXM at the undulator U41 at BESSY II
Authors: Niemann, B Guttmann, P Hambach, D Schneider, G Weiss, D Schmahl, G
Citation: B. Niemann et al., A rotating condenser and off-axis zone plate monochromator for the TXM at the undulator U41 at BESSY II, NUCL INST A, 467, 2001, pp. 857-860
Nanostructured diffractive optical devices for soft X-ray microscopes
Authors: Hambach, D Peuker, M Schneider, G
Citation: D. Hambach et al., Nanostructured diffractive optical devices for soft X-ray microscopes, NUCL INST A, 467, 2001, pp. 877-880
Efficient high-order diffraction of extreme-ultraviolet light and soft x-rays by nanostructured volume gratings
Authors: Hambach, D Schneider, G Gullikson, EM
Citation: D. Hambach et al., Efficient high-order diffraction of extreme-ultraviolet light and soft x-rays by nanostructured volume gratings, OPTICS LETT, 26(15), 2001, pp. 1200-1202
In situ x-ray microscopic observation of the electromigration in passivated Cu interconnects
Authors: Schneider, G Hambach, D Niemann, B Kaulich, B Susini, J Hoffmann, N Hasse, W
Citation: G. Schneider et al., In situ x-ray microscopic observation of the electromigration in passivated Cu interconnects, APPL PHYS L, 78(13), 2001, pp. 1936-1938
Few-cycle-driven XUV laser harmonics: generation and focusing
Authors: Schnurer, M Cheng, Z Hentschel, M Krausz, F Wilhein, T Hambach, D Schmahl, G Drescher, M Lim, Y Heinzmann, U
Citation: M. Schnurer et al., Few-cycle-driven XUV laser harmonics: generation and focusing, APP PHYS B, 70, 2000, pp. S227-S232
High aperture diffractive x-ray and extreme ultraviolet optical elements for microscopy and lithography applications
Authors: Hambach, D Schneider, G
Citation: D. Hambach et G. Schneider, High aperture diffractive x-ray and extreme ultraviolet optical elements for microscopy and lithography applications, J VAC SCI B, 17(6), 1999, pp. 3212-3216
Line width control using a defocused low voltage electron beam
Authors: David, C Hambach, D
Citation: C. David et D. Hambach, Line width control using a defocused low voltage electron beam, MICROEL ENG, 46(1-4), 1999, pp. 219-222
A slit grating spectrograph for quantitative soft x-ray spectroscopy
Authors: Wilhein, T Rehbein, S Hambach, D Berglund, M Rymell, L Hertz, HM
Citation: T. Wilhein et al., A slit grating spectrograph for quantitative soft x-ray spectroscopy, REV SCI INS, 70(3), 1999, pp. 1694-1699
Risultati: 1-9 |