Authors: Takahashi, K Han, LQ Pease, RF Meisburger, WD

Citation: K. Takahashi et al., Simulation of space charge neutralization using ions in electron beam projection optics, MICROEL ENG, 57-8, 2001, pp. 231-238

Authors: Han, LQ Pease, RF Meisburger, WD Winograd, GI Takahashi, K

Citation: Lq. Han et al., Scaled measurements of global space-charge induced image blur in electron beam projection system, J VAC SCI B, 18(6), 2000, pp. 2999-3003

Authors: Pease, RF Han, LQ Winograd, GI Meisburger, WD Pickard, D McCord, MA

Citation: Rf. Pease et al., Prospects for charged particle lithography as a manufacturing technology, MICROEL ENG, 53(1-4), 2000, pp. 55-60

Authors: Han, LQ McCord, MA Winograd, GI Pease, RFW

Citation: Lq. Han et al., Performance investigation of Coulomb interaction-limited high through put electron beam lithography based on empirical modeling, J VAC SCI B, 16(6), 1998, pp. 3215-3220