Authors: Hannemann, M Hardt, P Loffhagen, D Schmidt, M Winkler, R

Citation: M. Hannemann et al., The electron kinetics in the cathode region of H-2/Ar/N-2 discharges, PLASMA SOUR, 9(3), 2000, pp. 387-399

Authors: Goebel, C Hardt, P Doppl, W Temme, H Hackstein, N Klor, HU

Citation: C. Goebel et al., Frequency of pancreatitis after endoscopic retrograde cholangiopancreatography with iopromid or iotrolan: a randomized trial, EUR RADIOL, 10(4), 2000, pp. 677-680

Authors: Hardt, P Eckel, M Schmidt, M Wulff, H

Citation: P. Hardt et al., Influence of process parameters on the growth of TiN in different sized plasma-assisted chemical vapor deposition reactors, SURF COAT, 121, 1999, pp. 238-243

Authors: Eckel, M Hardt, P Schmidt, M

Citation: M. Eckel et al., Investigation of TiN deposition in different sized PACVD reactors by meansof optical emission spectroscopy, SURF COAT, 119, 1999, pp. 1037-1041