Authors:
Schneider, G
Hambach, D
Niemann, B
Kaulich, B
Susini, J
Hoffmann, N
Hasse, W
Citation: G. Schneider et al., In situ x-ray microscopic observation of the electromigration in passivated Cu interconnects, APPL PHYS L, 78(13), 2001, pp. 1936-1938