Authors: Vos, R Lux, M Xu, K Fyen, W Kenens, C Conard, T Mertens, P Heyns, M Hatcher, Z Hoffman, M

Citation: R. Vos et al., Removal of submicrometer particles from silicon wafer surfaces using HF-based cleaning mixtures, J ELCHEM SO, 148(12), 2001, pp. G683-G691