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Results:
1-8
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Results: 8
Authors:
Zhao, C
Roebben, G
Bender, H
Young, E
Haukka, S
Houssa, M
Naili, M
De Gendt, S
Heyns, M
Van Der Biest, O
Citation: C. Zhao et al., In situ crystallisation in ZrO2 thin films during high temperature X-ray diffraction, MICROEL REL, 41(7), 2001, pp. 995-998
Authors:
Perkins, CM
Triplett, BB
McIntyre, PC
Saraswat, KC
Haukka, S
Tuominen, M
Citation: Cm. Perkins et al., Electrical and materials properties of ZrO2 gate dielectrics grown by atomic layer chemical vapor deposition, APPL PHYS L, 78(16), 2001, pp. 2357-2359
Authors:
Puurunen, RL
Root, A
Haukka, S
Iiskola, EI
Lindblad, M
Krause, AOI
Citation: Rl. Puurunen et al., IR and NMR study of the chemisorption of ammonia on trimethylaluminum-modified silica, J PHYS CH B, 104(28), 2000, pp. 6599-6609
Authors:
Kim, YB
Tuominen, M
Raaijmakers, I
de Blank, R
Wilhelm, R
Haukka, S
Citation: Yb. Kim et al., Initial stage of the ultrathin oxide growth in water vapor on Si(100) surface, EL SOLID ST, 3(7), 2000, pp. 346-349
Authors:
Puurunen, RL
Root, A
Sarv, P
Haukka, S
Iiskola, EI
Lindblad, M
Krause, AOI
Citation: Rl. Puurunen et al., Growth of aluminium nitride on porous silica by atomic layer chemical vapour deposition, APPL SURF S, 165(2-3), 2000, pp. 193-202
Authors:
Houssa, M
Tuominen, M
Naili, M
Afanas'ev, V
Stesmans, A
Haukka, S
Heyns, MM
Citation: M. Houssa et al., Trap-assisted tunneling in high permittivity gate dielectric stacks, J APPL PHYS, 87(12), 2000, pp. 8615-8620
Authors:
Haukka, S
Lakomaa, EL
Suntola, T
Citation: S. Haukka et al., Adsorption controlled preparation of heterogeneous catalysts, ST SURF SCI, 120, 1999, pp. 715-750
Authors:
Molenbroek, AM
Haukka, S
Clausen, BS
Citation: Am. Molenbroek et al., Alloying in Cu/Pd nanoparticle catalysts, J PHYS CH B, 102(52), 1998, pp. 10680-10689
Risultati:
1-8
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