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Results:
1-11
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Results: 11
Authors:
Taguchi, M
Hayano, K
Xu, Y
Moriyama, M
Kobayashi, Y
Hiratsuka, H
Ohno, S
Citation: M. Taguchi et al., Yields of tyrosines in the radiolysis of aqueous phenylalanine solutions by energetic heavy ions, RADIAT PH C, 60(4-5), 2001, pp. 263-268
Authors:
Hayatsu, M
Mizutani, A
Hashimoto, M
Sato, K
Hayano, K
Citation: M. Hayatsu et al., Purification and characterization of carbaryl hydrolase from Arthrobacter sp RC100, FEMS MICROB, 201(1), 2001, pp. 99-103
Authors:
Sakai, Y
Hayano, K
Yoshioka, H
Yoshioka, H
Citation: Y. Sakai et al., A novel method of dissolving chitosan in water for industrial application, POLYM J, 33(8), 2001, pp. 640-642
Authors:
Miura, T
Morimoto, T
Hayano, K
Kishimoto, T
Citation: T. Miura et al., Determination of uranium in water samples by ICP-AES with chelating resin disk preconcentration, BUNSEKI KAG, 49(4), 2000, pp. 245-249
Authors:
Hayano, K
Mochizuki, K
Citation: K. Hayano et K. Mochizuki, Conformation and configuration of humulene di- and triepoxides generated from four possible conformations of humulene 9,10-epoxide, HETEROCYCLE, 53(6), 2000, pp. 1269-1283
Authors:
Kamimura, Y
Hayano, K
Citation: Y. Kamimura et K. Hayano, Properties of protease extracted from tea-field soil, BIOL FERT S, 30(4), 2000, pp. 351-355
Authors:
Fukuda, H
Hayano, K
Shirai, S
Citation: H. Fukuda et al., Determination of high-order lens aberration using phase/amplitude linear algebra, J VAC SCI B, 17(6), 1999, pp. 3318-3321
Authors:
Miura, T
Hayano, K
Nakayama, K
Citation: T. Miura et al., Determination of Pb-210 and Po-210 in environmental samples by alpha ray spectrometry using an extraction chromatographic resin, ANAL SCI, 15(1), 1999, pp. 23-28
Authors:
Hayano, K
Maeshiro, T
Tatsuoka, F
Sato, T
Wang, L
Kodaka, T
Citation: K. Hayano et al., Shear banding in a sedimentary soft mudstone subjected to plane strain compression, GEOT TEST J, 22(1), 1999, pp. 67-79
Authors:
Asai, N
Hasegawa, N
Gotoh, Y
Satoh, H
Hayano, K
Imai, A
Okazaki, S
Citation: N. Asai et al., Proposal for the coma aberration dependent overlay error compensation technology, JPN J A P 1, 37(12B), 1998, pp. 6718-6722
Authors:
Gotoh, Y
Sohda, Y
Saitou, N
Tawa, T
Matsuzaka, T
Asai, N
Hayano, K
Hasegawa, N
Citation: Y. Gotoh et al., Pattern dependent alignment technique for mix-and-match electron-beam lithography with optical lithography, J VAC SCI B, 16(6), 1998, pp. 3202-3205
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