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Results: 26-27/27
Authors:
Jung, KB
Cho, H
Hahn, YB
Hays, DC
Lambers, ES
Park, YD
Feng, T
Childress, JR
Pearton, SJ
Citation: Kb. Jung et al., Comparison of Cl-2/He, Cl-2/Ar, and Cl-2/Xe plasma chemistries for dry etching of NiFe and NiFeCo, J ELCHEM SO, 146(4), 1999, pp. 1465-1468
Authors:
Hays, DC
Jung, KB
Hahn, YB
Lambers, ES
Pearton, SJ
Donahue, J
Johnson, D
Shul, RJ
Citation: Dc. Hays et al., Comparison of F-2-based gases for high-rate dry etching of Si, J ELCHEM SO, 146(10), 1999, pp. 3812-3816