Authors: Krivokapic, Z Heavlin, WD

Citation: Z. Krivokapic et Wd. Heavlin, Intrafield effects on device and circuit manufacturability: A statistical simulation approach, IEEE SEMIC, 12(4), 1999, pp. 437-451

Authors: Capodieci, L Subramanian, R Rangarajan, B Heavlin, WD Li, JW Bernard, DA Boksha, VV

Citation: L. Capodieci et al., Novel methodology for postexposure bake calibration and optimization basedon electrical linewidth measurement and process metamodeling, J VAC SCI B, 16(6), 1998, pp. 3752-3758