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Results:
1-9
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Results: 9
Authors:
Hebert, KR
Citation: Kr. Hebert, A mathematical model for the growth of aluminum etch tunnels, J ELCHEM SO, 148(6), 2001, pp. B236-B242
Authors:
Hebert, KR
Wu, HQ
Gessmann, T
Lynn, K
Citation: Kr. Hebert et al., Positron annihilation spectroscopy study of interfacial defects formed by dissolution of aluminum in aqueous sodium hydroxide, J ELCHEM SO, 148(2), 2001, pp. B92-B100
Authors:
Martin, T
Hebert, KR
Citation: T. Martin et Kr. Hebert, Atomic force microscopy study of anodic etching of aluminum - Etching morphology development and caustic pretreatment, J ELCHEM SO, 148(2), 2001, pp. B101-B109
Authors:
Hebert, KR
Citation: Kr. Hebert, Analysis of current-potential hysteresis during electrodeposition of copper with additives, J ELCHEM SO, 148(11), 2001, pp. C726-C732
Authors:
Wu, HQ
Zhang, X
Hebert, KR
Citation: Hq. Wu et al., Atomic force microscopy study of the initial stages of anodic oxidation ofaluminum in phosphoric acid solution, J ELCHEM SO, 147(6), 2000, pp. 2126-2132
Authors:
Tak, Y
Sinha, N
Hebert, KR
Citation: Y. Tak et al., Metal dissolution kinetics in aluminum etch tunnels, J ELCHEM SO, 147(11), 2000, pp. 4103-4110
Authors:
Sinha, N
Hebert, KR
Citation: N. Sinha et Kr. Hebert, Kinetic model for oxide film passivation in aluminum etch tunnels, J ELCHEM SO, 147(11), 2000, pp. 4111-4119
Authors:
Isaac, JW
Hebert, KR
Citation: Jw. Isaac et Kr. Hebert, Electrochemical current noise on aluminum microelectrodes, J ELCHEM SO, 146(2), 1999, pp. 502-509
Authors:
Wang, MH
Hebert, KR
Citation: Mh. Wang et Kr. Hebert, Metal and oxygen ion transport during ionic conduction in amorphous anodicoxide films, J ELCHEM SO, 146(10), 1999, pp. 3741-3749
Risultati:
1-9
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