Authors: Giuliani, JL Shamamian, VA Thomas, RE Apruzese, JP Mulbrandon, M Rudder, RA Hendry, RC Robson, AE

Citation: Jl. Giuliani et al., Two-dimensional model of a large area, inductively coupled, rectangular plasma source for chemical vapor deposition, IEEE PLAS S, 27(5), 1999, pp. 1317-1328