Authors:
Giuliani, JL
Shamamian, VA
Thomas, RE
Apruzese, JP
Mulbrandon, M
Rudder, RA
Hendry, RC
Robson, AE
Citation: Jl. Giuliani et al., Two-dimensional model of a large area, inductively coupled, rectangular plasma source for chemical vapor deposition, IEEE PLAS S, 27(5), 1999, pp. 1317-1328