Citation: Jj. Metois et al., Step flow growth of vicinal (111)Si surface at high temperatures: step kinetics or surface diffusion control, SURF SCI, 486(1-2), 2001, pp. 95-102
Citation: Jc. Heyraud et al., The roughening transition of the Si{113} and Si{110} surfaces - an in situ, real time observation, SURF SCI, 425(1), 1999, pp. 48-56