Authors: Worhoff, K Driessen, A Lambeck, PV Hilderink, LTH Linders, PWC Popma, TJA

Citation: K. Worhoff et al., Plasma enhanced chemical vapor deposition silicon oxynitride optimized forapplication in integrated optics, SENS ACTU-A, 74(1-3), 1999, pp. 9-12