Authors:
Wind, RA
Murtagh, MJ
Mei, F
Wang, Y
Hines, MA
Sass, SL
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Citation: Ra. Wind et Ma. Hines, Macroscopic etch anisotropies and microscopic reaction mechanisms: a micromachined structure for the rapid assay of etchant anisotropy, SURF SCI, 460(1-3), 2000, pp. 21-38
Citation: Ta. Newton et al., The correlation between surface morphology and spectral lineshape: a re-examination of the H-Si(111) stretch vibration, SURF SCI, 430(1-3), 1999, pp. 67-79
Citation: Ta. Newton et al., The site-specific reactivity of isopropanol in aqueous silicon etching: Controlling morphology with surface chemistry, J CHEM PHYS, 111(20), 1999, pp. 9125-9128
Citation: J. Flidr et al., An atomistic mechanism for the production of two- and three-dimensional etch hillocks on Si(111) surfaces, J CHEM PHYS, 111(15), 1999, pp. 6970-6981