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Results: 1-14 |
Results: 14
On the determination of energy fluxes at plasma-surface processes
Authors: Kersten, H Rohde, D Steffen, H Deutsch, H Hippler, R Swinkels, GHPM Kroesen, GMW
Citation: H. Kersten et al., On the determination of energy fluxes at plasma-surface processes, APPL PHYS A, 72(5), 2001, pp. 531-540
Micro-disperse particles in plasmas: From disturbing side effects to new applications
Authors: Kersten, H Deutsch, H Stoffels, E Stoffels, WW Kroesen, GMW Hippler, R
Citation: H. Kersten et al., Micro-disperse particles in plasmas: From disturbing side effects to new applications, CONTR PLASM, 41(6), 2001, pp. 598-609
The energy balance at substrate surfaces during plasma processing
Authors: Kersten, H Deutsch, H Steffen, H Kroesen, GMW Hippler, R
Citation: H. Kersten et al., The energy balance at substrate surfaces during plasma processing, VACUUM, 63(3), 2001, pp. 385-431
Fundamental processes of plasma-surface interactions
Authors: Hippler, R
Citation: R. Hippler, Fundamental processes of plasma-surface interactions, ADV ATOM MO, 43, 2000, pp. 341-371
Investigations on the energy influx at plasma surface processes
Authors: Kersten, H Rohde, D Deutsch, H Hippler, R Stoffels, WW Stoffels, E Kroesen, GMW Berndt, J
Citation: H. Kersten et al., Investigations on the energy influx at plasma surface processes, ACT PHYS SL, 50(4), 2000, pp. 439-459
Sputtering yield and dynamical analysis of Ni(100) surface: A comparison of four different Ar-surface interaction potentials
Authors: Guvenc, ZB Hundur, Y Hippler, R
Citation: Zb. Guvenc et al., Sputtering yield and dynamical analysis of Ni(100) surface: A comparison of four different Ar-surface interaction potentials, NUCL INST B, 164, 2000, pp. 854-860
In situ studies of diffusion and crystal growth in plasma deposited thin ITO films
Authors: Wulff, H Quaas, M Steffen, H Hippler, R
Citation: H. Wulff et al., In situ studies of diffusion and crystal growth in plasma deposited thin ITO films, THIN SOL FI, 377, 2000, pp. 418-424
Investigations on the energy influx at plasma processes by means of a simple thermal probe
Authors: Kersten, H Rohde, D Berndt, J Deutsch, H Hippler, R
Citation: H. Kersten et al., Investigations on the energy influx at plasma processes by means of a simple thermal probe, THIN SOL FI, 377, 2000, pp. 585-591
Investigation of the aluminium oxidation in an oxygen plasma excited by microwaves
Authors: Quade, A Wulff, H Steffen, H Tun, TM Hippler, R
Citation: A. Quade et al., Investigation of the aluminium oxidation in an oxygen plasma excited by microwaves, THIN SOL FI, 377, 2000, pp. 626-630
The growth process of plasma-deposited ITO films investigated by grazing incidence X-ray techniques
Authors: Quaas, M Steffen, H Hippler, R Wulff, H
Citation: M. Quaas et al., The growth process of plasma-deposited ITO films investigated by grazing incidence X-ray techniques, SURF SCI, 454, 2000, pp. 790-795
Energy influx from an rf plasma to a substrate during plasma processing
Authors: Kersten, H Stoffels, E Stoffels, WW Otte, M Csambal, C Deutsch, H Hippler, R
Citation: H. Kersten et al., Energy influx from an rf plasma to a substrate during plasma processing, J APPL PHYS, 87(8), 2000, pp. 3637-3645
Thick-target X-ray bremsstrahlung spectra produced in 6.5 keV and 7.5 keV e(-)-Hf collisions
Authors: Goel, SK Hippler, R Singh, RK Shanker, R
Citation: Sk. Goel et al., Thick-target X-ray bremsstrahlung spectra produced in 6.5 keV and 7.5 keV e(-)-Hf collisions, PRAMANA-J P, 52(5), 1999, pp. 493-502
Investigation of relative sputtering yields during ionoluminescence of Si
Authors: Bhattacharyya, SR Brinkmann, U Hippler, R
Citation: Sr. Bhattacharyya et al., Investigation of relative sputtering yields during ionoluminescence of Si, APPL SURF S, 150(1-4), 1999, pp. 107-114
Angular distribution of hydrogen fragment ions in H+-H-2 collisions
Authors: Siegmann, B Hippler, R
Citation: B. Siegmann et R. Hippler, Angular distribution of hydrogen fragment ions in H+-H-2 collisions, AUST J PHYS, 52(3), 1999, pp. 537-544
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