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Results: 1-2 |
Results: 2
SiO2 thickness determination by x-ray photoelectron spectroscopy, Auger electron spectroscopy, secondary ion mass spectrometry, Rutherford backscattering, transmission electron microscopy, and ellipsometry
Authors: Cole, DA Shallenberger, JR Novak, SW Moore, RL Edgell, MJ Smith, SP Hitzman, CJ Kirchhoff, JF Principe, E Nieveen, W Huang, FK Biswas, S Bleiler, RJ Jones, K
Citation: Da. Cole et al., SiO2 thickness determination by x-ray photoelectron spectroscopy, Auger electron spectroscopy, secondary ion mass spectrometry, Rutherford backscattering, transmission electron microscopy, and ellipsometry, J VAC SCI B, 18(1), 2000, pp. 440-444
Surface quantification by ion implantation through a removable layer
Authors: Stevie, FA Roberts, RF McKinley, JM Decker, MA Granger, CN Santiesteban, R Hitzman, CJ
Citation: Fa. Stevie et al., Surface quantification by ion implantation through a removable layer, J VAC SCI B, 18(1), 2000, pp. 483-488
Risultati: 1-2 |