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Results: 1-25 | 26-27 |
Results: 26-27/27
High selectivity dry etching of InGaP over AlInP in BI3 and BBr3 plasma chemistries
Authors: Hong, J Cho, H Maeda, T Abernathy, CR Pearton, SJ Shul, RJ Hobson, WS
Citation: J. Hong et al., High selectivity dry etching of InGaP over AlInP in BI3 and BBr3 plasma chemistries, EL SOLID ST, 1(1), 1998, pp. 56-57
Inductively coupled plasma and electron cyclotron resonance plasma etchingof an InGaAlP compound semiconductor system
Authors: Hong, J Lambers, ES Abernathy, CR Pearton, SJ Shul, RJ Hobson, WS
Citation: J. Hong et al., Inductively coupled plasma and electron cyclotron resonance plasma etchingof an InGaAlP compound semiconductor system, CR R SOLID, 23(4), 1998, pp. 323-396
Risultati: 1-25 | 26-27 |