Authors:
Tyagi, AK
Breuer, U
Holzbrecher, H
Becker, JS
Dietze, HJ
Kappius, L
Bay, HL
Mantl, S
Citation: Ak. Tyagi et al., The influence of an epitaxial CoSi2 layer on diffusion of B and Sb in underlying Si during oxidation, FRESEN J AN, 365(1-3), 1999, pp. 282-285