Authors: Hopfe, V Sheel, DW Raisbeck, D Rivero, JM Graehlert, W Throl, O van Mol, AMB Spee, CIMA

Citation: V. Hopfe et al., NIR diode laser based process control for industrial CVD reactors, J PHYS IV, 11(PR3), 2001, pp. 1153-1159

Authors: Hopfe, V Sheel, DW Graehlert, W Throl, O

Citation: V. Hopfe et al., NIR laser diode and FTIR based process control for industrial CVD reactors, SURF COAT, 142, 2001, pp. 328-332

Authors: Vogt, U Vital, A Graehlert, W Leparoux, M Ewing, H Beil, A Daum, R Hopfe, V

Citation: U. Vogt et al., In-situ FTIR spectroscopic monitoring of a CVD controlled Si-N-O fibre growth process, J PHYS IV, 10(P2), 2000, pp. 43-48

Authors: Hopfe, V Grahlert, W Throl, O

Citation: V. Hopfe et al., FTIR based process control for industrial reactors, J PHYS IV, 9(P8), 1999, pp. 995-1002

Authors: Grahlert, W Leupolt, B Hopfe, V

Citation: W. Grahlert et al., Optical modelling vs. FTIR reflectance microscopy: characterization of laser treated ceramic fibres, VIB SPECTR, 19(2), 1999, pp. 353-359