Authors:
Cheng, ZY
Currie, MT
Leitz, CW
Taraschi, G
Fitzgerald, EA
Hoyt, JL
Antoniadas, DA
Citation: Zy. Cheng et al., Electron mobility enhancement in strained-Si n-MOSFETs fabricated on SiGe-on-insulator (SGOI) substrates, IEEE ELEC D, 22(7), 2001, pp. 321-323
Authors:
Singh, DV
Mitchell, TO
Hoyt, JL
Gibbons, JF
Johnson, NM
Gotz, WK
Citation: Dv. Singh et al., Effect of grown-in biaxial strain on deep level defects in Si1-yCy/Si epitaxial heterostructures, PHYSICA B, 274, 1999, pp. 681-684
Authors:
Singh, DV
Rim, K
Mitchell, TO
Hoyt, JL
Gibbons, JF
Citation: Dv. Singh et al., Measurement of the conduction band offsets in Si/Si1-x-yGexCy and Si/Si1-yCy heterostructures using metal-oxide-semiconductor capacitors, J APPL PHYS, 85(2), 1999, pp. 978-984
Authors:
Singh, DV
Rim, K
Mitchell, TO
Hoyt, JL
Gibbons, JF
Citation: Dv. Singh et al., Admittance spectroscopy analysis of the conduction band offsets in Si/Si1-x-yGexCy and Si/Si1-yCy heterostructures, J APPL PHYS, 85(2), 1999, pp. 985-993