Authors:
Hudek, P
Hrkut, P
Drzik, M
Kostic, I
Belov, M
Torres, J
Wasson, J
Wolfe, JC
Degen, A
Rangelow, IW
Voigt, J
Butschke, J
Letzkus, F
Springer, R
Ehrmann, A
Kaesmaier, R
Kragler, K
Mathuni, J
Haugeneder, E
Loschner, H
Citation: P. Hudek et al., Directly sputtered stress-compensated carbon protective layer for silicon stencil masks, J VAC SCI B, 17(6), 1999, pp. 3127-3131