Authors:
Cui, H
Bhat, IB
Murarka, SP
Lu, HQ
Li, WD
Hsia, WJ
Catabay, W
Citation: H. Cui et al., Chemical mechanical polishing of low dielectric constant oxide films deposited using flowfill chemical vapor deposition technology, J ELCHEM SO, 147(10), 2000, pp. 3816-3819