Authors: Chen, CC Lin, HC Chang, CY Liang, MS Chien, CH Hsien, SK Huang, TY

Citation: Cc. Chen et al., Improved immunity to plasma damage in ultrathin nitrided oxides, IEEE ELEC D, 21(1), 2000, pp. 15-17

Authors: Chen, CC Lin, HC Chang, CY Liang, MS Chien, CH Hsien, SK Huang, TY Chao, TS

Citation: Cc. Chen et al., Plasma-induced charging damage in ultrathin (3-nm) gate oxides, IEEE DEVICE, 47(7), 2000, pp. 1355-1360

Authors: Lin, HC Chen, CC Wang, MF Hsien, SK Chien, CH Huang, TY Chang, CY

Citation: Hc. Lin et al., Oxide thickness dependence of plasma charging damage, MICROEL REL, 39(3), 1999, pp. 357-364