Authors: Nordheden, KJ Hua, XD Lee, YS Yang, LW Streit, DC Yen, HC

Citation: Kj. Nordheden et al., Smooth and anisotropic reactive ion etching of GaAs slot via holes for monolithic microwave integrated circuits using Cl-2/BCl3/Ar plasmas, J VAC SCI B, 17(1), 1999, pp. 138-144