Authors: Koyanagi, K Kishimoto, K Huo, TC Matsumoto, A Okada, N Sumihiro, N Gomi, H

Citation: K. Koyanagi et al., Stability and application to multilevel metallization of fluorine-doped silicon oxide by high-density plasma chemical vapor deposition, JPN J A P 1, 39(3A), 2000, pp. 1091-1097