Authors: Jung, KB Hong, J Childress, JR Pearton, SJ Sharifi, F Jenson, M Hurst, AT

Citation: Kb. Jung et al., Plasma etching of NiFe Cu and NiMnSb/Al2O3 multilayers for sub-micron pattern definition, J MAGN MAGN, 199, 1999, pp. 204-206

Authors: Jung, KB Hong, J Cho, H Caballero, JA Childress, JR Pearton, SJ Jenson, M Hurst, AT

Citation: Kb. Jung et al., High density plasma etching of NiFe, NiFeCo and NiMnSb-based multilayers for magnetic storage elements, APPL SURF S, 139, 1999, pp. 111-116

Authors: Jung, KB Cho, H Hahn, YB Lambers, ES Onishi, S Johnson, D Hurst, AT Childress, JR Park, YD Pearton, SJ

Citation: Kb. Jung et al., Relative merits of Cl-2 and CO/NH3 plasma chemistries for dry etching of magnetic random access memory device elements, J APPL PHYS, 85(8), 1999, pp. 4788-4790