Authors: Tsuchizawa, T Iriguchi, H Takahashi, C Shimada, M Uchiyama, S Oda, M

Citation: T. Tsuchizawa et al., Electron cyclotron resonance plasma etching of alpha-Ta for X-ray mask absorber using chlorine and fluoride gas mixture, JPN J A P 1, 39(12B), 2000, pp. 6914-6918