Authors: Sato, K Asaumi, K Kobayashi, G Iriye, Y Shikida, M

Citation: K. Sato et al., Development of an orientation-dependent anisotropic etching simulation system MICROCAD, ELEC C JP 2, 83(4), 2000, pp. 13-22

Authors: Sato, K Shikida, M Yamashiro, T Asaumi, K Iriye, Y Yamamoto, M

Citation: K. Sato et al., Anisotropic etching rates of single-crystal silicon for TMAH water solution as a function of crystallographic orientation, SENS ACTU-A, 73(1-2), 1999, pp. 131-137