Authors: Nordquist, K Resnick, DJ Ivin, V Mangat, P Lu, B Masnyj, Z Ainley, E Dauksher, WJ Mancini, D Silakov, M Minyushkin, D Vorotnikova, N

Citation: K. Nordquist et al., Large area electron scattering effects on SCALPEL mask critical dimension control, MICROEL ENG, 57-8, 2001, pp. 505-510

Authors: Resnick, DJ Nordquist, K Dauksher, WJ Ainley, E Lu, B Mangat, P Weisbrod, E Martin, C Chang, J Englestad, R Lovell, E Ivin, V

Citation: Dj. Resnick et al., Critical dimension issues for 200 mm electron projection masks, JPN J A P 1, 39(12B), 2000, pp. 6874-6880