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Authors: BOUSABA JE TRANJAN FM QUSHAIR LE DUBOIS TD BOBBIO SM JOSE MT NICKEL JL JONES SK DUDLEY BW
Citation: Je. Bousaba et al., PLASMA RESISTANT MODIFIED I-LINE, DEEP UV, AND E-BEAM RESISTS, IEEE transactions on components, packaging, and manufacturing technology. Part A, 18(1), 1995, pp. 195-200

Authors: LAKSHMANAN AR JOSE MT
Citation: Ar. Lakshmanan et Mt. Jose, LOW-DOSE MEASUREMENTS WITH CASO4DY, CASO4TM AND CASO4DY TEFLON DOSIMETERS - A COMPARATIVE-STUDY, Radiation protection dosimetry, 46(3), 1993, pp. 181-187
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