Authors:
BOUSABA JE
TRANJAN FM
QUSHAIR LE
DUBOIS TD
BOBBIO SM
JOSE MT
NICKEL JL
JONES SK
DUDLEY BW
Citation: Je. Bousaba et al., PLASMA RESISTANT MODIFIED I-LINE, DEEP UV, AND E-BEAM RESISTS, IEEE transactions on components, packaging, and manufacturing technology. Part A, 18(1), 1995, pp. 195-200
Citation: Ar. Lakshmanan et Mt. Jose, LOW-DOSE MEASUREMENTS WITH CASO4DY, CASO4TM AND CASO4DY TEFLON DOSIMETERS - A COMPARATIVE-STUDY, Radiation protection dosimetry, 46(3), 1993, pp. 181-187