Authors:
Uhl, A
Bendig, J
Leistner, J
Jagdhold, U
Bauch, L
Bottcher, M
Citation: A. Uhl et al., Nonstatistical degradation and development characteristics of poly(methyrmethacrylate) based resists during electron beam exposure, J VAC SCI B, 16(6), 1998, pp. 2968-2973