Authors:
Gall, D
Stadele, M
Jarrendahl, K
Petrov, I
Desjardins, P
Haasch, RT
Lee, TY
Greene, JE
Citation: D. Gall et al., Electronic structure of ScN determined using optical spectroscopy, photoemission, and ab initio calculations - art. no. 125119, PHYS REV B, 6312(12), 2001, pp. 5119
Authors:
Hultaker, A
Jarrendahl, K
Lu, J
Granqvist, CG
Niklasson, GA
Citation: A. Hultaker et al., Electrical and optical properties of sputter deposited tin doped indium oxide thin films with silver additive, THIN SOL FI, 392(2), 2001, pp. 305-310
Authors:
Broitman, E
Hellgren, N
Jarrendahl, K
Johansson, MP
Olafsson, S
Radnoczi, G
Sundgren, JE
Hultman, L
Citation: E. Broitman et al., Electrical and optical properties of CNx(0 <= x <= 0.25) films deposited by reactive magnetron sputtering, J APPL PHYS, 89(2), 2001, pp. 1184-1190
Authors:
Lindquist, OPA
Jarrendahl, K
Peters, S
Zettler, JT
Cobet, C
Esser, N
Aspnes, DE
Henry, A
Edwards, NV
Citation: Opa. Lindquist et al., Ordinary and extraordinary dielectric functions of 4H-and 6H-SiC from 3.5 to 9.0 eV, APPL PHYS L, 78(18), 2001, pp. 2715-2717
Authors:
Edwards, NV
Jarrendahl, K
Aspnes, DE
Robbie, K
Powell, GD
Cobet, C
Esser, N
Richter, W
Madsen, LD
Citation: Nv. Edwards et al., Real-time assessment of selected surface preparation regimens for 4H-SiC surfaces using spectroscopic ellipsometry, SURF SCI, 464(1), 2000, pp. L703-L707
Authors:
Adsten, M
Joerger, R
Jarrendahl, K
Wackelgard, E
Citation: M. Adsten et al., Optical characterization of industrially sputtered nickel-nickel oxide solar selective surface, SOLAR ENERG, 68(4), 2000, pp. 325-328
Authors:
Ronning, C
Dalmer, M
Uhrmacher, M
Restle, M
Vetter, U
Ziegeler, L
Hofsass, H
Gehrke, T
Jarrendahl, K
Davis, RF
Citation: C. Ronning et al., Ion implanted dopants in GaN and AlN: Lattice sites, annealing behavior, and defect recovery, J APPL PHYS, 87(5), 2000, pp. 2149-2157
Authors:
Tungasmita, S
Birch, J
Persson, POA
Jarrendahl, K
Hultman, L
Citation: S. Tungasmita et al., Enhanced quality of epitaxial AlN thin films on 6H-SiC by ultra-high-vacuum ion-assisted reactive dc magnetron sputter deposition, APPL PHYS L, 76(2), 2000, pp. 170-172