AAAAAA

   
Results: 1-9 |
Results: 9
Expanding microwave plasma for steel carburizing: Role of the plasma impinging species on the steel surface reactivity
Authors: Jauberteau, I Cinelli, MJ Cahoreau, M Jauberteau, JL Aubreton, J
Citation: I. Jauberteau et al., Expanding microwave plasma for steel carburizing: Role of the plasma impinging species on the steel surface reactivity, J VAC SCI A, 18(1), 2000, pp. 108-114
Measurement of rate constants between atomic nitrogen and silane in a nitrogen discharge afterglow
Authors: Aubreton, J Conte, D Jauberteau, JL Jauberteau, I
Citation: J. Aubreton et al., Measurement of rate constants between atomic nitrogen and silane in a nitrogen discharge afterglow, J PHYS D, 33(12), 2000, pp. 1499-1506
Reaction rate constant for Ar(P-3(2)) metastable atoms with the tetramethylsilane molecule
Authors: Jauberteau, JL Jauberteau, I Aubreton, J
Citation: Jl. Jauberteau et al., Reaction rate constant for Ar(P-3(2)) metastable atoms with the tetramethylsilane molecule, CHEM P LETT, 327(5-6), 2000, pp. 351-358
Characterization of an Ar-TMS microwave discharge using mass spectrometry:effect of the reactor design on free-radical contents
Authors: Jauberteau, JL Aubreton, J Jauberteau, I
Citation: Jl. Jauberteau et al., Characterization of an Ar-TMS microwave discharge using mass spectrometry:effect of the reactor design on free-radical contents, INT J MASS, 189(1), 1999, pp. 63-77
RMPECVD of silica films in large scale microwave plasma reactor: Films properties
Authors: Naudin, F Tristant, P Hugon, MC Jauberteau, I Agius, B Desmaison, J
Citation: F. Naudin et al., RMPECVD of silica films in large scale microwave plasma reactor: Films properties, J PHYS IV, 9(P8), 1999, pp. 819-826
Plasma nitriding of thin molybdenum layers at low temperature
Authors: Jauberteau, I Jauberteau, JL Semeria, MN Larre, A Piaguet, J Aubreton, J
Citation: I. Jauberteau et al., Plasma nitriding of thin molybdenum layers at low temperature, SURF COAT, 119, 1999, pp. 222-228
A spatially resolved plasma diagnostic in an expanding microwave dischargecontaining an Ar-CH4 gas mixture: uniformity and stability of the discharge
Authors: Jauberteau, JL Cinelli, MJ Jauberteau, I Aubreton, J
Citation: Jl. Jauberteau et al., A spatially resolved plasma diagnostic in an expanding microwave dischargecontaining an Ar-CH4 gas mixture: uniformity and stability of the discharge, J PHYS D, 32(4), 1999, pp. 445-455
SrBi2Nb2O9 ferroelectric thin films
Authors: Yi, JH Thomas, P Manier, M Mercurio, JP Jauberteau, I Frit, B
Citation: Jh. Yi et al., SrBi2Nb2O9 ferroelectric thin films, J PHYS IV, 8(P9), 1998, pp. 225-228
SrBi2Nb2O9 ferroelectric powders and thin films prepared by sol-gel
Authors: Yi, JH Thomas, P Manier, M Mercurio, JP Jauberteau, I Guinebretiere, R
Citation: Jh. Yi et al., SrBi2Nb2O9 ferroelectric powders and thin films prepared by sol-gel, J SOL-GEL S, 13(1-3), 1998, pp. 885-888
Risultati: 1-9 |