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Results:
1-7
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Results: 7
Authors:
Tristant, P
Ding, Z
Vinh, QBT
Hidalgo, H
Jauberteau, JL
Desmaison, J
Dong, C
Citation: P. Tristant et al., Microwave plasma enhanced CVD of aluminum oxide films: OES diagnostics andinfluence of the RF bias, THIN SOL FI, 390(1-2), 2001, pp. 51-58
Authors:
Jauberteau, I
Cinelli, MJ
Cahoreau, M
Jauberteau, JL
Aubreton, J
Citation: I. Jauberteau et al., Expanding microwave plasma for steel carburizing: Role of the plasma impinging species on the steel surface reactivity, J VAC SCI A, 18(1), 2000, pp. 108-114
Authors:
Aubreton, J
Conte, D
Jauberteau, JL
Jauberteau, I
Citation: J. Aubreton et al., Measurement of rate constants between atomic nitrogen and silane in a nitrogen discharge afterglow, J PHYS D, 33(12), 2000, pp. 1499-1506
Authors:
Jauberteau, JL
Jauberteau, I
Aubreton, J
Citation: Jl. Jauberteau et al., Reaction rate constant for Ar(P-3(2)) metastable atoms with the tetramethylsilane molecule, CHEM P LETT, 327(5-6), 2000, pp. 351-358
Authors:
Jauberteau, JL
Aubreton, J
Jauberteau, I
Citation: Jl. Jauberteau et al., Characterization of an Ar-TMS microwave discharge using mass spectrometry:effect of the reactor design on free-radical contents, INT J MASS, 189(1), 1999, pp. 63-77
Authors:
Jauberteau, I
Jauberteau, JL
Semeria, MN
Larre, A
Piaguet, J
Aubreton, J
Citation: I. Jauberteau et al., Plasma nitriding of thin molybdenum layers at low temperature, SURF COAT, 119, 1999, pp. 222-228
Authors:
Jauberteau, JL
Cinelli, MJ
Jauberteau, I
Aubreton, J
Citation: Jl. Jauberteau et al., A spatially resolved plasma diagnostic in an expanding microwave dischargecontaining an Ar-CH4 gas mixture: uniformity and stability of the discharge, J PHYS D, 32(4), 1999, pp. 445-455
Risultati:
1-7
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